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Cabot Microelectronics to Hold Annual Meeting of Shareholders on March 6

AURORA, Ill.--(BUSINESS WIRE)--March 1, 2007--Cabot Microelectronics Corporation (Nasdaq:CCMP), the world's leading supplier of chemical mechanical planarization (CMP) polishing slurries to the semiconductor industry, has announced its Annual Meeting of Shareholders will be held Tuesday, March 6, 2007, at 8:00 a.m., Central Time.

Presentation material for the Annual Meeting will be available to all interested parties in the Investor Relations section of the company's website, In addition, those interested can listen to the live meeting by phone at (877) 690-6769. Callers outside the U.S. can dial (212) 231-6029.

A transcript of the formal comments made during the Annual Meeting will be available in the Investor Relations section of the company's website.

About Cabot Microelectronics

Cabot Microelectronics Corporation, headquartered in Aurora, Illinois, is the world's leading supplier of CMP slurries used in semiconductor and data storage manufacturing. The company's products play a critical role in the production of the most advanced semiconductor devices, enabling the manufacture of smaller, faster and more complex devices by its customers. Since becoming an independent public company in 2000, the company has grown to approximately 750 employees who work at research and development labs, sales and business offices, manufacturing facilities and customer service centers in China, France, Germany, Japan, Singapore, South Korea, Taiwan, the United Kingdom and the United States. The company's vision is to become the world leader in shaping, enabling and enhancing the performance of surfaces, and thus looks beyond its core CMP business in the semiconductor industry. For more information about Cabot Microelectronics Corporation, visit or contact Amy Ford, Director of Investor Relations, at (630) 499-2600.

CONTACT: Cabot Microelectronics Corporation
Amy Ford, Director of Investor Relations, 630-499-2600

SOURCE: Cabot Microelectronics Corporation

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