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Cabot Microelectronics Announces the Adoption of SiLECT(TM) 6000/EPIC Technology for 90-nm Semiconductor Manufacturing

STI CMP Consumable Set Delivers Low Defectivity and Excellent Planarity

AURORA, Ill., Jan. 15 /PRNewswire-FirstCall/ -- Cabot Microelectronics Corp. (Nasdaq: CCMP), the leading supplier of chemical mechanical planarization (CMP) polishing slurries to the semiconductor industry, today announced that its new direct shallow trench isolation (STI) slurry, SiLECT(TM) 6000 in combination with its new line of Epic(R) A110 polishing pads has been adopted by a major integrated circuit (IC) manufacturer for use in its high volume 90-nm manufacturing process.

Employing a breakthrough direct STI polishing mechanism known as "Selective Deceleration", SiLECT(TM) 6000 is designed to deliver exceptional process performance in both 200 mm and 300 mm manufacturing processes. Easy- to-use and fully compatible with existing CMP polishing tools and delivery systems, SiLECT(TM) 6000 is designed to improve process yields and reduce overall cost-of-ownership.

Cabot Microelectronics' Epic(R) A110 CMP polishing pads are designed to deliver superior defect performance and pad-to-pad reliability in both 200 mm and 300 mm manufacturing processes. Manufactured in a highly consistent, single sheet format under cleanroom conditions, these CMP polishing pads incorporate robust grooving and window technologies.

By taking full advantage of both technologies in a consumable set, the IC manufacturer has been able to achieve optimized performance in their 90-nm STI process. "Our new direct STI technology has eliminated the need for expensive on-site mixing required by older direct STI technologies. The new process is simple to implement in manufacturing environments where consistent results are required," said Steve Smith, vice president of sales and marketing at Cabot Microelectronics. "By using our SiLECT(TM) 6000 slurry and Epic(R) A110 pads, we have enabled a 90-nm process that provides low defectivity, excellent planarity, and highly consistent performance in full-scale manufacturing."

About Cabot Microelectronics

Cabot Microelectronics Corp., headquartered in Aurora, Ill., is the leading supplier of CMP slurries for polishing various materials used in semiconductor manufacturing processes. These products enable manufacturers of ICs to make smaller, faster and more complex devices and improve their production processes. For more information about Cabot Microelectronics, visit www.cabotcmp.com or call 630-499-2600.

Safe Harbor Statement

This news release may include statements that constitute "forward-looking statements" within the meaning of federal securities regulations. These forward-looking statements include statements related to product performance, future sales and operating results, company and industry growth and trends, growth of this market, international events, new product introductions and development of new products and technologies by Cabot Microelectronics. These forward-looking statements involve a number of risks, uncertainties, and other factors, including those described from time to time in Cabot Microelectronics' filings with the Securities and Exchange Commission (SEC), that could cause the actual results to differ materially from those described by these forward-looking statements. In particular, see "Risks Relating to Our Business" in Management's Discussion and Analysis in our annual report on Form 10-K for the fiscal year ended September 30, 2003, filed with the SEC. Cabot Microelectronics Corporation assumes no obligation to update this forward-looking statement.

    Contact:
    Gautam Grover
    Global Marketing Manager
    Cabot Microelectronics Corporation
    630-375-5567
SOURCE  Cabot Microelectronics Corporation
    -0-                             01/15/2004
    /CONTACT:  Gautam Grover, Global Marketing Manager of Cabot
Microelectronics Corporation, +1-630-375-5567/
    /Web site:  http://www.cabotcmp.com /
    (CCMP)

CO:  Cabot Microelectronics Corporation
ST:  Illinois
IN:  CHM CPR SEM ECP
SU:  CON

JK-LC 
-- CGTH008 --
1552 01/15/2004 08:00 EST http://www.prnewswire.com

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